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中文摘要: 采用非平衡磁控溅射技术在 Q235 钢基体上制备了 TiAlN 薄膜， 研究了沉积工艺参数对薄膜微观形貌、 力
学性能及耐腐蚀性能的影响规律， 通过扫描电镜、 纳米力学探针、 划痕测试仪对薄膜的微观形貌和力学性能进行
表征， 并利用盐雾试验和电化学极化测试研究了薄膜在含 Cl- 环境中的腐蚀行为。 结果表明， 随着 N2 流量的升
高， TiAlN 薄膜的硬度和结合力先升高后降低， 当 N2 流量为 10sccm 时， 薄膜具有最高的硬度和结合力， 分别为
30.7GPa 和 44.2N， 其耐腐蚀性能最优。 随着 Al 靶功率的增加， 薄膜的硬度和结合力先增大后减小， 当 Al 靶功
率为 90W 时， 薄膜的硬度和结合力达到了最大值， 分别为 28.6GPa 和 38.4N， 具有最佳的抗腐蚀性能。 随着基体
温度的升高， 薄膜的硬度和结合力逐渐增大， 基体温度低于 300℃时， 增大幅度较明显， 基体温度高于 300℃时，
二者增加幅度趋于平缓， 薄膜表现出优异的耐腐蚀性能。
Abstract:TiAlN films were deposited on the surface of Q235 steel by unbalanced magnetron sputtering
technology. The effects of deposition parameters on the morphology, mechanical properties and corrosion
resistance of TiAlN films were studied. The microstructure and mechanical properties of the films were tested by
scanning electron microscope, nanomechanical probe and scratch tester. The corrosion behavior of TiAlN films in
the environment containing Cl- was investigated by salt spray test and electrochemical polarization test. The results
showed that with the increase of N2 flow rate the hardness and bonding force of TiAlN films first increased and
then decreased. When the N2 flow rate was 10 sccm, the film showed the highest hardness and bonding force, 30.7
GPa and 44.2 N, respectively, and exhibited the best corrosion resistance. With the increase of Al target power, the
hardness and bonding force of the film first increased and then decreased. When the Al target power was 90 W, the
hardness and bonding force of the film reached the maximum, that was 28.6 GPa and 38.4 N, respectively, which
exhibited best corrosion resistance. With the increase of the substrate temperature, the hardness and bonding force of the film gradually increased. When the substrate temperature was lower than 300℃ , the increase of the hardness
and bonding force was more obvious. When the substrate temperature was higher than 300℃ , the increase range of the
hardness and bonding force tended to be flat, and the film exhibited excellent corrosion resistance.
文章编号： 中图分类号：TG174.4 文献标志码：
基金项目:
| 作者 | 单位 |
| 刘安强 | 矿冶科技集团有限公司 北京市工业部件表面强化与修复工程技术研究中心 特种涂层材料与技术北京市重点实验室 |
| 袁建鹏 | 矿冶科技集团有限公司 北京市工业部件表面强化与修复工程技术研究中心 特种涂层材料与技术北京市重点实验室 |
| 谢建刚 | 矿冶科技集团有限公司 北京市工业部件表面强化与修复工程技术研究中心 特种涂层材料与技术北京市重点实验室 |
引用文本：
刘安强,袁建鹏,谢建刚.沉积工艺对磁控溅射 TiAlN 薄膜微观形貌及性能的影响[J].热喷涂技术,2021,13(1):33-42.
Liu Anqiang,Yuan Jianpeng,Xie Jiangang.Influence of Deposition Process on Microstructure and Properties of Magnetron Sputtered TiAlN Films[J].Thermal Spray Technology,2021,13(1):33-42.
刘安强,袁建鹏,谢建刚.沉积工艺对磁控溅射 TiAlN 薄膜微观形貌及性能的影响[J].热喷涂技术,2021,13(1):33-42.
Liu Anqiang,Yuan Jianpeng,Xie Jiangang.Influence of Deposition Process on Microstructure and Properties of Magnetron Sputtered TiAlN Films[J].Thermal Spray Technology,2021,13(1):33-42.