刘安强,袁建鹏,谢建刚.非平衡磁控溅射 TiAlN 薄膜的抗高温氧化行为研究[J].热喷涂技术,2021,13(2):62~68.
非平衡磁控溅射 TiAlN 薄膜的抗高温氧化行为研究
Study on High-temperature Oxidation Resistant Behavior ofTiAlN Films Deposited by Unbalanced Magnetron Sputtering
  
DOI:10.3969/j.issn.1674-7127.2021.02.008
中文关键词:  磁控溅射  TiAlN 薄膜  显微组织  显微硬度  抗氧化性能
英文关键词:Magnetron sputtering  TiAlN films  Microstructure  Microhardness  Oxidation resistance
基金项目:
        
作者单位
刘安强 矿冶科技集团有限公司, 北京市工业部件表面强化与修复工程技术研究中心, 特种涂层材料与技术北京市重点实验室
袁建鹏 矿冶科技集团有限公司, 北京市工业部件表面强化与修复工程技术研究中心, 特种涂层材料与技术北京市重点实验室
谢建刚 矿冶科技集团有限公司, 北京市工业部件表面强化与修复工程技术研究中心, 特种涂层材料与技术北京市重点实验室
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中文摘要:
      采用非平衡磁控溅射技术在 Q235 钢基体上制备了 TiAlN 薄膜, 通过精密电子天平、 纳米力学探针、 划痕测试仪及扫描电镜等测试分析, 研究了薄膜氧化动力学行为、 薄膜显微硬度和结合力的变化规律及不同温度 下氧化后薄膜表面形貌演变规律, 探讨了 TiAlN 薄膜的抗高温氧化机制。 结果表明, 在 700℃以上 TiAlN 薄膜的 氧化动力学行为服从抛物线规律。 随着氧化温度的升高, 薄膜的显微硬度和结合力逐渐下降, 当氧化温度升高到 800℃时, 薄膜具有较高的显微硬度和结合力, 分别为 19.3 GPa 和 32.1 N, 表现出良好的抗高温氧化性能。 当氧 化温度升高到 900℃时, 薄膜表面出现了明显的鼓包和裂纹, 此时薄膜发生了严重氧化, 薄膜已失去对基体的保 护作用。
英文摘要:
      TiAlN films were deposited on the surface of Q235 steel by unbalanced magnetron sputtering technique. The oxidation kinetics, microhardness and bonding force of the film, and Evolution of surface morphology of films after oxidation at different temperatures were tested by precision electronic balance, nanomechanical probe, scratch tester and scanning electron microscope. The mechanism of high temperature oxidation resistance of TiAlN films was discussed. The results showed that the oxidation kinetics of TiAlN film obeyed parabolic law above 700℃ . With the increase of oxidation temperature, the microhardness and bonding force of the film decreased gradually. When the oxidation temperature increased to 800℃ , the film showed high microhardness and adhesion, which were 19.3 GPa and 32.1 N, respectively, which exhibited good oxidation resistance at high temperature. When the oxidation temperature reached 900℃ , the surface of the film appeared obviously bulge and cracks. Meanwhile, the film had been seriously oxidized and the film had lost its protective effect on the substrate
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