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热喷涂技术:2022,14(1):55-60
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偏压参数对多弧离子镀 CrN 薄膜力学性能的影响
(1.中国农业机械化科学研究院集团有限公司;2.北京金轮坤天特种机械有限公司;3.土壤植物机器系统技术国家重点实验室)
Effect of Bias Parameters on the Mechanical Properties of CrN Films Fabricated by Multi-arc Ion Plating
(1.Chinese Academy of Agricultural Mechanization Sciences Group Co., Ltd., Beijing 100083;2.Beijing Golden Wheel Special Machine Co., Ltd., Beijing 100083;3.State Key Laboratory of Soil-Plant-Machine System Technology, Beijing 100083)
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中文摘要: 利用研发的多弧离子镀设备在高速钢基材上制备 CrN 薄膜,研究偏压参数对 CrN 薄膜表面形貌和力学性 能的影响。结果表明,在偏压参数幅值增加的过程中,薄膜表面大颗粒的数量和尺寸呈现先减小后增大的变化趋 势,薄膜硬度和结合力均呈现先增大后减小的变化趋势。残余应力随着偏压参数幅值的增加而逐渐增大。
Abstract:The CrN films were prepared on HSS substrates using the developed multi-arc ion plating equipment, and the effects of bias voltage on the surface morphologies and mechanical properties of CrN films were investigated. As the bias voltage increased, the number and sizes of large particles on the surface of the films showed a trend to decline first and then go up, while the hardness and bonding force of the films showed a trend to rise first and then decrease. The residual stress gradually increased with the increase of bias voltage.
文章编号:     中图分类号:TG174.4    文献标志码:
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引用文本:
李碧晗,詹华,李振东,吴佳亿,汪瑞军.偏压参数对多弧离子镀 CrN 薄膜力学性能的影响[J].热喷涂技术,2022,14(1):55-60.

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